1 results
In Situ Plasma Analysis, Fluorine Incorporation, Thermostability, Stress, and Hardness Comparison of Fluorinated Amorphous Carbon and Hydrogenated Amorphous Carbon Thin Films Deposited on Si by Plasma Enhanced Chemical Vapor Deposition
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 565 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 285
- Print publication:
- 1999
-
- Article
- Export citation