7 results
Electron Cyclotron Resonance Etching of SiC in SF6/O2 and NF3 /O2 Plasmas
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- Journal:
- MRS Online Proceedings Library Archive / Volume 421 / 1996
- Published online by Cambridge University Press:
- 10 February 2011, 251
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- 1996
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High-Temperature Switching Characteristics of 6H-SiC Thyristor
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- Journal:
- MRS Online Proceedings Library Archive / Volume 423 / 1996
- Published online by Cambridge University Press:
- 15 February 2011, 93
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- 1996
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Dry Etching of SiC for Advanced Device Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 421 / 1996
- Published online by Cambridge University Press:
- 10 February 2011, 153
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- 1996
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Comparison of Microwave ECR and RF Plasmas for Dry Etching of Single Crystal 6H-SiC
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- Journal:
- MRS Online Proceedings Library Archive / Volume 339 / 1994
- Published online by Cambridge University Press:
- 21 February 2011, 145
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- 1994
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Silicon Nitride Deposited at Very Low Silane Pressures Using Electron Cyclotron Resonance Plasmas
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- Journal:
- MRS Online Proceedings Library Archive / Volume 284 / 1992
- Published online by Cambridge University Press:
- 22 February 2011, 15
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- 1992
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Rapid Plan View Fabrication of Semiconductor Tem Samples for Interface Strain and Grain Size Analysis
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- Journal:
- MRS Online Proceedings Library Archive / Volume 254 / 1991
- Published online by Cambridge University Press:
- 21 February 2011, 233
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- 1991
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Photoreflectance and Double Crystal X-Ray Study of Strained InGaAsP Layers on InP Substrates
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- Journal:
- MRS Online Proceedings Library Archive / Volume 216 / 1990
- Published online by Cambridge University Press:
- 25 February 2011, 335
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- 1990
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