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Comparison between conventional and hollow cathode magnetron sputtering systems on the growing of titanium dioxide thin films: a correlation between the gas discharge and film formation
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- Journal:
- The European Physical Journal - Applied Physics / Volume 54 / Issue 2 / May 2011
- Published online by Cambridge University Press:
- 18 May 2011, 20801
- Print publication:
- May 2011
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- Article
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