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In Situ Plasma Analysis, Fluorine Incorporation, Thermostability, Stress, and Hardness Comparison of Fluorinated Amorphous Carbon and Hydrogenated Amorphous Carbon Thin Films Deposited on Si by Plasma Enhanced Chemical Vapor Deposition
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- Journal:
- MRS Online Proceedings Library Archive / Volume 565 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 285
- Print publication:
- 1999
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- Article
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Characterization and Dielectric Properties of Fluorinated Amorphous Carbon Measured by Capacitance-Voltage Response and Spectroscopic Ellipsometry
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- Journal:
- MRS Online Proceedings Library Archive / Volume 593 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 341
- Print publication:
- 1999
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- Article
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