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Ultrasmooth, Conducting Films Composed of Mo/Si Multilayers

Published online by Cambridge University Press:  15 February 2011

D. G. Stearns ,
S. L. Baker  and
M. A. Wall
D. G. Stearns
Affiliation:
Lawrence Livermore National Laboratory, P.O. Box 808, Livermore CA 94551
S. L. Baker
Affiliation:
Lawrence Livermore National Laboratory, P.O. Box 808, Livermore CA 94551
M. A. Wall
Affiliation:
Lawrence Livermore National Laboratory, P.O. Box 808, Livermore CA 94551
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Abstract

We investigate the variation of microstructure and electron transport with layer thickness in Mo/Si multilayer films deposited by magnetron sputtering.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 403: Symposium I – Polycrystalline Thin Films: Structure, Texture, Properties and Applications II , 1995 , 183
Copyright
Copyright © Materials Research Society 1996

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References

1) Stearns, D. G., Rosen, R. S. and Vernon, S. P., J. Vac. Sci. Technol. A 9, 2662 (1991).Google Scholar
2) Sondheimer, E. H., Advan. Phys. 1, 1 (1952).Google Scholar