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Surface Temperature Rise Induced by a Focused Laser Beam. Application to Laser-Induced Chemical Vapor Deposition

Published online by Cambridge University Press:  28 February 2011

Toivo T. Kodas ,
Thomas H. Baum  and
Paul B. Comita
Toivo T. Kodas
Affiliation:
IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120
Thomas H. Baum
Affiliation:
IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120
Paul B. Comita
Affiliation:
IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120
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Abstract

Surface temperatures of a laser-heated structure consisting of intersecting gold and nickel lines on an Si substrate with an SiO2 surface layer were determined experimentally and theoretically. Temperatures were measured with micron-sized thin-film thermocouples formed from intersecting gold and nickel lines. Temperature profiles were calculated using a finite difference method which took into account the optical and physical properties of the thermocouple metal lines, the silicon dioxide layer and the silicon substrate. For a 0.2 μm SiO2 layer, maximum surface temperatures were much higher with the metal lines than without because of the lower reflectivity of the gold relative to the silicon and the limited ability of the thin metal lines to conduct heat away from the irradiated region. Calculated maximum temperatures on the metal lines depended strongly on the thicknesses of the insulating SiO2 layer and the metal lines. Application of these results to the dynamics of laser-induced chemical vapor deposition is discussed.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 75: Symposium B – Photon, Beam, and Plasma Stimulated Chemical Processes at Surfaces , 1986 , 57
Copyright
Copyright © Materials Research Society 1987

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