Hostname: page-component-78c5997874-j824f Total loading time: 0 Render date: 2024-11-02T21:23:45.199Z Has data issue: false hasContentIssue false
  • English
  • Français

Studies of In0.53Ga0.47As/InP Superlattice Mixing and Conversion

Published online by Cambridge University Press:  26 February 2011

S.A. Schwarz ,
P. Mei ,
D.M. Hwang ,
C.L. Schwartz ,
T. Venkatesan ,
C.J. Palmstrøm ,
N.G. Stoffel  and
R. Bhat
S.A. Schwarz
Affiliation:
Bellcore, Red Bank, NJ 07701–7040
P. Mei
Affiliation:
Serin Physics Laboratory, Rutgers University, Piscataway, NJ 08854
D.M. Hwang
Affiliation:
Bellcore, Red Bank, NJ 07701–7040
C.L. Schwartz
Affiliation:
Bellcore, Red Bank, NJ 07701–7040
T. Venkatesan
Affiliation:
Bellcore, Red Bank, NJ 07701–7040
C.J. Palmstrøm
Affiliation:
Bellcore, Red Bank, NJ 07701–7040
N.G. Stoffel
Affiliation:
Bellcore, Red Bank, NJ 07701–7040
R. Bhat
Affiliation:
Bellcore, Red Bank, NJ 07701–7040
Get access

Abstract

Sealed ampoule Zn diffusions into an unstrained In0.53Ga0.47As/InP superlattice are observed to preferentially induce cation (In, Ga) interdiffusion. The extent of interdiffusion is monitored in these studies by SIMS (secondary ion mass spectrometry). In some cases, Zn entirely displaces In in the InP layers forming an In1−xGaxAs/Zn3P2 superlattice. Under still more stringent conditions, all In and Ga is replaced, resulting in a Zn3As2/Zn3P2 superlattice. These structures are capable of supporting considerable strain due to the absence of grown-in defects. TEM (transmission electron microscopy) micrographs of several samples reveal defect free highly strained layers with thicknesses exceeding the predicted critical values. A high dose Zn implant was examined in which mixing proceeded until the Zn concentration dropped below a threshold concentration of approximately 1020 cm−3 during the anneal. These results, in total, strongly support a kickout mechanism for Zn induced mixing. Si diffusion was observed, in one case, to induce comparable cation and anion interdiffusion, thereby reducing the layer bandgap disparity, as opposed to Zn which increases the difference in layer bandgaps. Almost no interdiffusion was induced by Si diffusion from MBE (molecular beam epitaxy) polycrystalline Si films, due either to the very high resultant Si concentrations or to the capping effect of the film. The data suggest that both anion and cation site defects play a role in the Si induced mixing process.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 144: Symposium W – Advances in Materials, Processing and Devices in III-V Compound Semiconductors , 1988 , 233
Copyright
Copyright © Materials Research Society 1989

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Schwarz, SA., Mei, P., Venkatesan, T., Bhat, R., Hwang, D.M., Schwartz, C.L., Koza, M., Nazar, L., and Skromme, B.J., AppI. Phys. Lett. 53, 1051 (1988)Google Scholar
[2] Hwang, D.M., Schwarz, S.A., Mei, P., Bhat, R., Venkatesan, T., Nazar, L., and Schwartz, C.L., to be publishedGoogle Scholar
[3] Landolt-Bornstein, , New Series, Vol. III-17e, Madelung, O., ed. (Springer-Verlag, Berlin, 1983)Google Scholar
[4] Nakashima, K., Kawaguchi, Y., Kawamura, Y., Asahi, H., and Imamura, Y., Jpn. J. Appl. Phys. 26, L1620 (1987)Google Scholar
[5] Tell, B., Johnson, B.C., Zyskind, J.L., Brown, J.M., Sulhoff, J.W., Brown-Goebeler, K.F., Miller, B.I., and Koren, U., Appl. Phys. Lett. 52, 1428 (1988)Google Scholar
[6] Pape, I.J. Wa, P. Li Kam, David, J.P.R., Claxton, P.A., and Robson, P.N., Elect. Lett. 24, 1217 (1988)CrossRefGoogle Scholar
[7] Willoughby, A.F.W., Materials Research Society Symp. Proc. Vol.14, pp.237–252 (Elsevier Science Publ., Amsterdam, 1983)Google Scholar
[8] Schwarz, S.A., Venkatesan, T., and Mei, P., Materials Research Society Symp. Proc. Vol.126, pp. 43–54 (Mat. Res. Soc., Pittsburgh, 1988)Google Scholar
[9] Baraff, GA. and Schluter, M., Phys. Rev. Lett. 55, 1327 (1985)Google Scholar
[10] Werner, J., Kapon, E., Von Lehman, A., Bhat, R., Colas, E., Stoffel, N.G., and Schwarz, S.A., Appl. Phys. Lett. 53, 1693 (1988)Google Scholar
[11] Myers, D.R., Materials Research Society Symp. Vol.126, pp. 195–206 (Mat. Res. Soc., Pittsburgh, 1988)Google Scholar
[12] Dautremont-Smith, W.C., Dick, J., Lopata, J., Schwarz, S.A., and Swaminathan, V., SIMS VI, pp. 733–736 (J. Wiley, New York, 1988)Google Scholar