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Single Grain Si TFTs Fabricated at 100oC for Microelectronics on a Plastic Substrate

Published online by Cambridge University Press:  01 February 2011

Ming He ,
R. Ishihara ,
T. Chen ,
J.W. Metselaar  and
C.I.M. Beenakker
Ming He
Affiliation:
[email protected], Delft University of Technology, Delft Institute of Microelectronics and Submicrontechnology (DIMES), Feldmannweg 17, Delft, 2628CT, Netherlands
R. Ishihara
Affiliation:
[email protected], Delft University of Technology, Delft Institute of Microelectronics and Submicrontechnology (DIMES), Feldmannweg 17, Delft, 2628CT, Netherlands
T. Chen
Affiliation:
[email protected], Delft University of Technology, Delft Institute of Microelectronics and Submicrontechnology (DIMES), Feldmannweg 17, Delft, 2628CT, Netherlands
J.W. Metselaar
Affiliation:
[email protected], Delft University of Technology, Delft Institute of Microelectronics and Submicrontechnology (DIMES), Feldmannweg 17, Delft, 2628CT, Netherlands
C.I.M. Beenakker
Affiliation:
[email protected], Delft University of Technology, Delft Institute of Microelectronics and Submicrontechnology (DIMES), Feldmannweg 17, Delft, 2628CT, Netherlands
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Abstract

Single grain TFTs are fabricated at a maximum temperature of 100oC for macroelectronics on a plastic substrate, as Si channels are fabricated at 100oC by combination of excimer laser crystallization and sputtering. The gate oxide is formed at 80°C by inductively coupled plasma enhanced chemical vapor deposition. These TFTs have shown a smaller threshold swing of 0.49 V/dec. and a higher field-effect mobility of 290 cm2/V·s, which can be used to directly fabricate system circuits or a high quality display on a plastic substrate.

Keywords

polycrystallasermicroelectronics
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 989: Symposium A – Amorphous and Polycrystalline Thin-Film Silicon Science and Technology-2007 , 2007 , 0989-A09-05
Copyright
Copyright © Materials Research Society 2007

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