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Self-Organized Nanostructure Formation for Anti-Reflection Glass Surfaces

Published online by Cambridge University Press:  16 March 2012

Jörn Achtelik ,
Ricarda M. Kemper ,
Werner Sievers  and
Jörg K. N. Lindner
Jörn Achtelik
Affiliation:
University of Paderborn, Department of Physics, Warburger Str. 100, 33098 Paderborn, Germany
Ricarda M. Kemper
Affiliation:
University of Paderborn, Department of Physics, Warburger Str. 100, 33098 Paderborn, Germany
Werner Sievers
Affiliation:
University of Paderborn, Department of Physics, Warburger Str. 100, 33098 Paderborn, Germany
Jörg K. N. Lindner
Affiliation:
University of Paderborn, Department of Physics, Warburger Str. 100, 33098 Paderborn, Germany
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Abstract

Two methods to create biomimetic anti-reflection nanostructures in ordinary glass microscope object slides are presented. One technique is based on a nanosphere lithography process combined with physical vapour deposition of nickel and reactive ion etching (RIE). The other uses plasma induced dewetting of a smooth nickel surface. The amount of reflected light was measured and a method to simulate the reflectivity from an atomic force microscopy (AFM) topography scan of the glass surface is presented. The reflectivity for visible light at normal incidence was reduced to 20-50 % of the original value with both methods and the simulation gives results in good agreement to the measurement.

Keywords

reactive ion etchingoptical propertiesnanostructure
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1389: Symposium G – Applications of Hierarchical 3D Structures , 2012 , mrsf11-1389-g03-18
Copyright
Copyright © Materials Research Society 2012

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References

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