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The Role of Single and Multi-Electron Excitations in Electron Stimulated Desorption

Published online by Cambridge University Press:  28 February 2011

P H. Avouris
Affiliation:
IBM T. J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598
F. Bozso
Affiliation:
IBM T. J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598
A. R. Rossi
Affiliation:
IBM T. J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598
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Abstract

We investigate the nature of the electronic transitions which lead to the desorption of ions from adsorbate-covered metal and semiconductor surfaces. F+ desorption from F/Si occurs via a Knotek-Feibelman mechanism, while H+ desorption from H/Si and O+ from CO/metals involve multi-electron transitions. The desorption of CO+ from CO/metals and NO+ from NO/Si apparently occurs via a simple Menzel-Gomer-Redhead mechanism.

Type
Articles
Copyright
Copyright © Materials Research Society 1987

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References

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