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the Microstructure and Electrical Resistivity of Cluster-Based thin Films

Published online by Cambridge University Press:  15 February 2011

Jeffery D. Bielefeld  and
Ronald P. Andres
Jeffery D. Bielefeld
Affiliation:
School of Chemical Engineering, Purdue University, West Lafayette, IN 47907
Ronald P. Andres
Affiliation:
School of Chemical Engineering, Purdue University, West Lafayette, IN 47907
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Abstract

Cluster-assembled thin metal films exhibit properties which are different from those of films obtained by conventional atomic-deposition. We present TEM data on the evolution of 2-D Microstructure and SFM data on the evolution of 3-D Microstructure in thin films grown by vacuum deposition of preformed silver clusters and of preformed acetylene-silver clusters on flat SiO2, and Mica. Electrical resistivity measurements of cluster-based Ag and Ag/C2H2 films deposited on glass substrates with nominal film thicknesses of 5 nm - 50 nm are also presented and discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 317: Symposium B – Mechanisms of Thin Film Evolution , 1993 , 155
Copyright
Copyright © Materials Research Society 1994

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References

REFERENCES

[1] Andres, R.P., Averback, R.S., Brown, W. L., Brus, L. E., Goddard, W. A. III, Kaldor, A., Louie, S. G., Moscovite, M., Peercy, P. S., Riley, S. J., Siegel, R. W., Spaepen, F., and Wang, Y., J. Mater. Res. 4, 704–736 (1989).Google Scholar
[2] Asano, Y., Thin Solid Films 105, 1–8 (1983).Google Scholar
[3] Perrin, J., Despax, B., Hanchett, V., and Kay, E., J. Vac. Technol. A 4, 46–51 (1986).CrossRefGoogle Scholar
[4] Dagani, R., C&EN 70, 39–40 (1992).Google Scholar
[5] Heilmann, A., Hamann, C., Kampfrath, G., and Uan, D. N., Phys. Stat. Sol. A 114, 551–558 (1989).Google Scholar
[6] Flouttard, J. L., Akinnifesi, J., Cambril, E., and Despax, B., J. Appl. Phys. 70, 798–804 (1991).Google Scholar
[7] Ansari, S., MS Thesis, Purdue University, 1990.Google Scholar
[8] Park, S. B., PhD Thesis, Purdue University, 1988.Google Scholar
[9] Ramachandra, A., MS Thesis, Purdue University, 1989.Google Scholar
[10] Chopra, K. L., Thin Film Phenomena. 1st ed. (McGraw-Hill, New York, 1969), Chp. 4.Google Scholar
[11] Sugawara, A., Nakamura, Y., and Nittono, O., J. Cryst. Growth 99, 583–587 (1990).CrossRefGoogle Scholar
[12] Bielefeld, J. D., MS Thesis, Purdue University, 1993.Google Scholar
[13] Fuchs, K., Proc. Camb. Phil. Soc. 34, 100–108 (1938).CrossRefGoogle Scholar