Hostname: page-component-586b7cd67f-g8jcs Total loading time: 0 Render date: 2024-11-28T22:39:12.344Z Has data issue: false hasContentIssue false

HRTEM and EELS Studies of GdSi2 Nanostructures Grown by Self-Assembly

Published online by Cambridge University Press:  26 February 2011

Jiaming Zhang
Affiliation:
[email protected], Michigan State Univ., Chemical Eng. & Materials Sci., 2527 Engineering Bld, East lansing, MI, 48824, United States
Gangfeng Ye
Affiliation:
[email protected], Michigan State University, Department of Chemical Engineering and Materials Science, United States
R. Loloee
Affiliation:
[email protected], Michigan State University, Department of Physics and Astronomy, United States
Martin A. Crimp
Affiliation:
[email protected], Michigan State University, Department of Chemical Engineering and Materials Science, United States
Jun Nogami
Affiliation:
[email protected], Univeristy of Toronto, Department of Materials Science and Engineering, Canada
Get access

Abstract

There has been considerable interest in the properties of rare earth metal nanostructures grown epitaxially on Si(001) surfaces. The questions arises as to what extent the nanometer scale lateral dimensions (width and thickness) affect the material properties. We compare thin film Gd silicide samples with Gd nanostructures grown on Si(001) using high resolution transmission electron microscopy (HRTEM). The nanostructures have the same orthorhombic crystal structure as the thicker silicide films. Electron energy loss spectroscopy measurements from metallic Gd and the thin film silicides are also shown as references for similar measurements on the nanostructures.

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Preinesberger, C., Vandré, S., Kalka, T., Dähne-Prietch, M., J. Phys. D 31 L43 (1998)Google Scholar
2 Chen, Y., Ohlberg, D.A.A., Medeiros-Ribeiro, G., Chang, Y.A., Williams, R.S., Appl. Phys. Lett., 76 4004 (2000)Google Scholar
3 Nogami, J., Liu, B.Z., Katkov, M.V., Ohbuchi, C., Birge, N.O., Phys. Rev. B 63 233 (2001)Google Scholar
4 Chen, Y., Ohlberg, D. A.A., and Williams, R. S., J. App. Phys. 91 3213, (2002)Google Scholar
5 Ohbuchi, C. and Nogami, J., Phys. Rev. B 66, 165323 (2002)Google Scholar
6 Gangfeng Ye, Crimp, M.A., Nogami, J., Thin Solid Films(in press)Google Scholar
7 Egerton, R. F., Electron Energy-Loss Spectroscopy in the Electron Microscope, 2nd ed. (Plenum, New York, 1996)Google Scholar
8 Manoubi, T., Colliex, C. and Rez, P., J. Electr. Spectr. and Rel. Phen., 50 1 (1990)Google Scholar
9 Maex, K. and Rossum, M., Properties of Metal Silicides. London: INSPEC (1995)Google Scholar
10 Ahn, C. C., Transmission Electron Energy Loss Spectrometry in Materials Science and the EELS ATALS, 2nd ed. (WILEY-VCH, 2004)Google Scholar
11 Iandelli, A., Palenzona, A. and Olcese, G. L., J. Less- Common Metals 64 213 (1979)Google Scholar
12 Suenaga, K., Iijima, S., Kato, H. and Shinohara, H., Phys. Rev. B 62 1627 (2000)Google Scholar