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Gas Phase Characterization in LP CVD Processes by a Performant Raman Equipment: Gas Temperature in the Vicinity of the Substrate
Published online by Cambridge University Press: 21 February 2011
Abstract
Using a performant spontaneous Raman equipment, with intracavity laser excitation, the temperatures of tungsten hexafluoride and hydrogen have been measured in a cell reproducing the industrial conditions of C.V.D. tungsten deposition, in the vicinity of a heated graphite substrate. For tungsten hexafluoride, a vibrational temperature, much lower than that of the substrate, is determined. For hydrogen, rotational temperatures much higher than that of the substrate are found. After a discussion of the sources of experimental errors, possible interpretations of the results are given.
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