Hostname: page-component-586b7cd67f-2brh9 Total loading time: 0 Render date: 2024-11-28T19:50:14.982Z Has data issue: false hasContentIssue false

Experimental Studies of Photoluminescence in Mn-Ion Implanted Silicon Rich Oxide Thin Film

Published online by Cambridge University Press:  01 February 2011

Wei Pan
Affiliation:
[email protected], Sandia National Labs, Semiconductor Material and Device Sciences, P.O. Box 5800, MS 1086, Albuquerque, New Mexico, 87185, United States
R.G. Dunn
Affiliation:
[email protected], Sandia National Laboratories, Albuquerque, New Mexico, 87185, United States
M.S. Carroll
Affiliation:
[email protected], Sandia National Laboratories, Albuquerque, New Mexico, 87185, United States
Y.Q. Wang
Affiliation:
[email protected], Los Alamos National Laboratory, Materials Science and Technology Division, Los Alamos, New Mexico, 87545, United States
Get access

Abstract

In this paper, we wish to report our preliminary experimental results from the photoluminescence (PL) studies in a Mn-ion implanted silicon-rich oxide (SRO) thin film. At 4 K, a broad PL peak, centered at ~ 1.2 eV, was observed. It is blue-shifted from the Si substrate peak at ~ 1.1 eV. The temperature (T) dependence of PL was carried out at zero magnetic (B) field and B = 0.5 Tesla, respectively, and showed quantitatively different behaviors. At B = 0, the PL intensity increases very slowly at low temperatures and reaches a maximal value at ~ 40 K. It then decreases as T is further increased. At B = 0.5 Tesla, the peak temperature (Tpeak), whether the intensity is maximal, moves to ~ 80-100 K, and the decreasing rate beyond Tpeak is much smaller than that at B = 0. We speculate that these two different behaviors might reveal, possibly, a ferromagnetic ordering in Mn-ion doped silicon nanocrystals.

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Wolf, S.A., Awschalom, D.D., Buhrman, R.A., Daughton, J.M., Molnár, S. von, Roukes, M.L., Chtchelkanova, A.Y., and Treger, D.M., Science 294, 1488 (2001).Google Scholar
2. Molnár, S. von and Read, D., Proc. IEEE 91, 715 (2003).Google Scholar
3. Ohno, H., Chiba, D., Matsukura, F., Omiya, T., Abe, E., Dietl, T., Ohno, Y., Ohtani, K., Nature 408, 944 (2000).Google Scholar
4. Bolduc, M., Awo-Affouda, C., Stollenwerk, A., Huang, M.B., Ramos, F.G., Agnello, G., and LaBella, V.P., Phys. Rev. B 71, 033302 (2005).Google Scholar
5. Yu, P.Y. and Cardona, M., Fundementals of semiconductors (Springer-Verlag, Belin, 1996).Google Scholar
6.See, for example, Canham, L.T., Appl. Phys. Lett. 57, 1046 (1990).Google Scholar
7. Puzder, A., Williamson, A.J., Grossman, J.C., and Galli, G., Phys. Rev. Lett. 88, 097401 (2002).Google Scholar
8. Brongersma, M.L., Kik, P.G., Polman, A., Min, K.S., and Atwater, H.A., Appl. Phys. Lett. 76, 351 (2000).Google Scholar
9. Wang, X.X., Zhang, J.G., Ding, L., Cheng, B.W., Ge, W.K., Yu, J.Z., and Wang, Q.M., Phys. Rev. B 72, 195313 (2005).Google Scholar