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Evaporative Deposition of Aluminum Single Crystals

Published online by Cambridge University Press:  11 February 2011

Alan Jankowski ,
Bob Vallier ,
Ann Bliss  and
Jeffrey Hayes
Alan Jankowski
Affiliation:
Chemistry & Materials Science, Lawrence Livermore National Laboratory, Livermore CA 94551–9900, U.S.A.
Bob Vallier
Affiliation:
Chemistry & Materials Science, Lawrence Livermore National Laboratory, Livermore CA 94551–9900, U.S.A.
Ann Bliss
Affiliation:
Chemistry & Materials Science, Lawrence Livermore National Laboratory, Livermore CA 94551–9900, U.S.A.
Jeffrey Hayes
Affiliation:
Mechanical Engineering, Lawrence Livermore National Laboratory, Livermore CA 94551–9900, U.S.A.
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Abstract

The classic zone model for growth of evaporated deposits serves a starting point for selecting the process conditions to produce dense crystalline coatings. The columnar structure intrinsic to vapor deposits evolves from the nano-to-millimeter scale as the substrate temperature increases to the melting point. In this paper, the deposition conditions are reviewed for the evolution of a single crystal structure in metal coatings. Experimental results are presented for the electron-beam deposition of aluminum coatings up to 100 μm in thickness. The deposition of a single crystal occurs when the coating temperature exceeds 530 °C, i.e. 85% of the absolute melt point.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 749: Symposium W – Morphological and Compositional Evolution of Thin Films , 2002 , W11.3
Copyright
Copyright © Materials Research Society 2003

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References

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