Hostname: page-component-78c5997874-t5tsf Total loading time: 0 Render date: 2024-11-03T08:09:21.552Z Has data issue: false hasContentIssue false

Electrochemical Modification of La2CuO4: The Role Played by Microstructure

Published online by Cambridge University Press:  10 February 2011

E. J. Williams
Affiliation:
IBM Research Division, Zurich Research Laboratory, CH-8803 Riischlikon, Switzerland DPMC, Université de Genève, CH-1211 Genève, Switzerland
A. Daridon
Affiliation:
IBM Research Division, Zurich Research Laboratory, CH-8803 Riischlikon, Switzerland Institut für Anorganische Chemie, Universität Bern, CH-3012 Bern, Switzerland
F. Arrouy
Affiliation:
IBM Research Division, Zurich Research Laboratory, CH-8803 Riischlikon, Switzerland
J. Fompeyrine
Affiliation:
IBM Research Division, Zurich Research Laboratory, CH-8803 Riischlikon, Switzerland Institut für Anorganische Chemie, Universität Bern, CH-3012 Bern, Switzerland
E. Mächler
Affiliation:
IBM Research Division, Zurich Research Laboratory, CH-8803 Riischlikon, Switzerland
H. Siegenthaler
Affiliation:
Institut für Anorganische Chemie, Universität Bern, CH-3012 Bern, Switzerland
J.-P. Locquet
Affiliation:
IBM Research Division, Zurich Research Laboratory, CH-8803 Riischlikon, Switzerland
Get access

Abstract

Using electrochemical oxidation as a probe technique for the mechanisms by which oxidation occurs in c-axis La2CuO4 films, the vital role played by specific through-film microstructural defects has been observed using transmission electron microscopy. These defects are namely the large through-film precipitates sometimes found in these films and {111} planar faults. Two high-oxygen-content phases are formed; one locally and with a superstructure, the other of reduced orthor-hombicity and larger c-axis than as-grown material. Some films were found not to oxidize, and the defects in these films were compared with those in the oxidizable films.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Opila, E.J., Tulle, H.L., and Wuensch, B.J., J. Am. Ceram. Soc. 76, 236 (1993).Google Scholar
2. Locquet, J.-R and Williams, E.J., Acta. Physica. Polonica A (1996) in press.Google Scholar
3. Wattiaux, A., Park, J.C., Grenier, J.C. and Pouchard, M., C. R. Acad. Sci. Paris 310(11), 1047 (1990).Google Scholar
4. Locquet, J.-P., Gerber, C., Cretton, A., Jaccard, Y., Williams, E.J. and Mächler, E., Appl. Phys. A 57, 211 (1993).Google Scholar
5. Arrouy, F., Locquet, J.-P., Williams, E.J., Mächler, E., Berger, R., Gerber, C., Monroux, C., Grenier, J.-C. and Wattiaux, A., Phys. Rev. B 54, 7512 (1996).Google Scholar
6. Locquet, J.-P., Arrouy, F., Mächler, E., Despont, M., Bauer, P. and Williams, E.J., Appl. Phys. Lett. 68, 1999(1996).Google Scholar
7. Monroux, C., Ph.D. Thesis, Bordeaux University, France, 1996.Google Scholar
8. Locquet, J.-P. and Mächler, E., MR.S. Bulletin 19, 39 (1994).Google Scholar
9. Daridon, A., Siegenthaler, H., Arrouy, F., Williams, E.J., Mächler, E. and Locquet, J.-P., Proc. E-MRS '96, J. Alloys & Compounds (1996) in press.Google Scholar
10. Williams, E.J., Daridon, A., Arrouy, F., Perret, J., Jaccard, Y, Locquet, J.-P., Mächler, E., Siegenthaler, H., Martinoli, P. and Fischer, Ø., Proc. E-MRS '96, J. Alloys & Compounds(1996) in press.Google Scholar
11. Williams, E.J., Locquet, J.-P., Mächler, E., Jaccard, Y., Cretton, A., Broom, R.F., Gerber, C., Schneider, T., Martinoli, P. and Fischer, Ø., Proc. EMAG '94, Inst. Phys. Conf. Ser. 138, 329 (1994).Google Scholar
12. Williams, E.J. and Stobbs, W.M., Phil. Mag. A 68, 1 (1993).Google Scholar
13. Woensdregt, C.F., private communication.Google Scholar