Hostname: page-component-788cddb947-rnj55 Total loading time: 0 Render date: 2024-10-15T09:21:18.591Z Has data issue: false hasContentIssue false
  • English
  • Français

The Effect of Metal Atoms and Ligand Combinations in Organometallics on Excimer Laser Photoproducts and Yields

Published online by Cambridge University Press:  25 February 2011

Y. Zhang  and
M. Stuke
Y. Zhang
Affiliation:
Max-Planck-Institut für biophysikalische Chemie Postfach 2841, D-3400 Güttingen, F.R. Germany
M. Stuke
Affiliation:
Max-Planck-Institut für biophysikalische Chemie Postfach 2841, D-3400 Güttingen, F.R. Germany
Get access

Abstract

A systematic study to find the role of different metal atoms and ligand combinations on the yield of the photoproducts generated upon irradiation of gas phase organometallics (i.e. metalalkyls) by uv excimer laser radiation was performed using laser ionization mass spectrometry.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 131: Symposium E – Chemical Perspectives of Microelectronic Materials I , 1988 , 375
Copyright
Copyright © Materials Research Society 1989

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Blonder, G.E., Higashi, G.S. and Fleming, C.G., Appl. Phys. Lett. 50, 766 (1987)CrossRefGoogle Scholar
[2] Aoyagi, Y., Masuda, S., Namba, S. and Doi, A., Appl. Phys. Lett. 47, 95 (1985)Google Scholar
[3] Cacouris, T., Scelsi, G., Shaw, P., Scarmozzino, R., Osgood, R.M. and Krchnavek, R.R., Appl. Phys. Lett. 52, 1865 (1988)Google Scholar
[4] Hanabusa, M., Hayakawa, K., Oikawa, A. and Maeda, K., Jpn. J. Appl. Phys. 27, L1392 (1988)Google Scholar
[5] Solanki, R., Ritchie, W.H. and Collins, G.J., Appl. Phys. Lett. 43, 454 (1983)Google Scholar
[6] Stuke, M., Appl. Phys. Lett. 45, 1175 (1984)Google Scholar
[7] all metal-alkyls from Alfa VentronGoogle Scholar
[8] Zhang, Y. and Stuke, M., Jpn. Appl. Phys. 27, L1349 (1988)Google Scholar
[9] Zhang, Y., Beuermann, Th. and Stuke, M., Appl. Phys. B 48, 97 (1989)Google Scholar
[10] Zhang, Y. and Stuke, M., Chemtronics, Dec. 1988 Google Scholar
[11] Fantoni, R. and Stuke, M., Appl. Phys. B 38, 209 (1985)Google Scholar
[12] Moore, C.E., Atomic Energy Levels, (CNBS 467, 1958)Google Scholar
[13] Hudgens, J.W., DiGiuseppe, T.G., and Lin, M.C., J. Chem. Phys. 79, 571 (1983)Google Scholar
[14] Larciprete, R. and Stuke, M., J. Phys. Chem. 90, 4568 (1986)Google Scholar
[15] DiGluseppe, T.G., Hudgens, J.W. and Lin, M.C., J. Phys. Chem. 86, 36 (1982)Google Scholar
[16] Young, P.I., Gosavi, R.K., Connor, J., Strausz, O.P., and Gunning, H.E., J. Chem. Phys. 58, 5280 (1973)Google Scholar
[17] about the dependence of the photoproduct yield on the excimer laser wavelengths please see: Zhang, Y. and Stuke, M., J. Crystal Growth 93, 143 (1988)Google Scholar
[18] Zhang, Y. and Stuke, M., Chem. Phys. Lett. 149, 310 (1988)Google Scholar