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Chemical Vapor Deposition of Niobium Carbide using a Novel Organometallic Precursor.
Published online by Cambridge University Press: 21 February 2011
Abstract
Chemical vapor deposition from (MeCp)2Nb(allyl) at atmospheric pressure yields niobium carbide films at temperatures as low as 300°C. X-ray photoelectron spectroscopy (XPS) studies indicate that the bulk films contain a carbide phase and a nearly stoichiometric ratio of niobium to carbon. The morphology of the films has been examined by scanning electron microscopy (SEM).
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