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Capacitance-Voltage, Current Voltage, and Thermal Stability of Copper Alloyed With Aluminum or Magnesium

Published online by Cambridge University Press:  10 February 2011

T. Suwwan de Felipe
Affiliation:
CIEEM and Dept. of Materials Science & Engineering, Rensselaer Polytechnic Institute, Troy, NY 1280
S. P. Murarka
Affiliation:
CIEEM and Dept. of Materials Science & Engineering, Rensselaer Polytechnic Institute, Troy, NY 1280
S. Bedell
Affiliation:
Dept. of Physics, State University of New York at Albany, Albany, NY 12222
W. A. Lanford
Affiliation:
Dept. of Physics, State University of New York at Albany, Albany, NY 12222
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Abstract

Copper alloyed with small amounts of aluminum or magnesium has recently been suggested as a promising material for interconnect applications in silicon integrated circuits. This work reports the results of the investigation of the electrical (capacitance-voltage and current-voltage) stability of the metal-oxide-semiconductor capacitor made with copper-0.5 at. % aluminum and copper-2 at. % magnesium as metal, deposited on thermally oxidized silicon substrates. Effect of thermal treatment in vacuum ambient before and/or during the electrical testing was investigated. The resistance to oxidation of these alloys was also investigated. The results show that copper magnesium, after a thermal treatment of 350°C or higher, produces a passivating layer at the interfaces that has excellent corrosion resistance and very stable behavior in terms of capacitance-voltage and current-voltage measurements. Copper aluminum performed adequately, much better than pure copper but was inferior to copper magnesium.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

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References

REFERENCES

1. Murarka, S. P., Materials Science and Eng., R19, 87 (1997).Google Scholar
2. McBrayer, J. D., Swanson, R. M., and Signmon, T. W., J. Electrochem Soc., 133, 1243 (1986).10.1149/1.2108827Google Scholar
3. Ding, P. J., Lanford, W. A., Hymes, S., and Murarka, S. P., Appl. Phys. Lett., 64, 2897 (1994).Google Scholar
4. Ding, P. J., Lanford, W. A., Hymes, S., and Murarka, S. P., J. of Appl. Phys., 75, 3627 (1994).Google Scholar
5. Toomey, J. J., Hymes, S., and Murarka, S. P., Appl. Phys. Lett., 66, 2074 (1995).Google Scholar
6. Takewaki, T., Kaihara, R., Ohmi, T., and Nitta, T., IEEE-IEDM 19995 Tech. Digest, No. 95CH-35810, IEEE, Piscataway, NY, 1995, p. 253.Google Scholar