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Atomic Force Microscopy Study of Stabilized Quasi-Amorphous Carbon in the Range of Thickness from 5 nm To 300 μm

Published online by Cambridge University Press:  10 February 2011

Fred H. Pollak ,
J. Z. Wan  and
Benjamin F. Dorfman
Fred H. Pollak
Affiliation:
Physics Department and New York State Center for Advanced Technology in Ultrafast Photonic Materials and Applications, Brooklyn College of CUNY, Brooklyn, NY 11210
J. Z. Wan
Affiliation:
Physics Department and New York State Center for Advanced Technology in Ultrafast Photonic Materials and Applications, Brooklyn College of CUNY, Brooklyn, NY 11210
Benjamin F. Dorfman
Affiliation:
Atomic Scale Design, Inc., 90 Lupton Hall, State University of New York-Farmingdale, Farmingdale, NY 11735
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Abstract

A new hard sp2-sp3 carbon stabilized by non-stoichiometric silica SiOx has been fabricated which combines a graphite-like layered structure with diamond-like mechanical properties, thermal stability and a very low density (≈ 1.6 g/cm3). This substance, which we refer to a quasi-amorphous material (QUASAM), has considerable potential applications as either thin films or bulk material since it can be grown as thick as 300 μm. Not only is the fine surface structure of crucial importance for thin films, but also the steadiness of a smooth growth front is a key factor for bulk material synthesis. Using atomic force microscopy (AFM) we have undertaken study of the surfaces/interfaces of such material over a wide range of thicknesses (5 nm < tf < 300 μm), including two free standing films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 466: Symposium G – Atomic Resolution Microscopy of Surfaces and Interfaces , 1996 , 233
Copyright
Copyright © Materials Research Society 1997

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References

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