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Surface Deformation of Metal Films Under Controlled Pressure for Generating Ultra-flat Metal Surfaces

Published online by Cambridge University Press:  01 February 2011

Logeeswaran Vj
Affiliation:
[email protected], University of California-Davis, Electrical & Computer Engineering, Kemper Hall,, One Shields Ave, DAVIS, CA, 95616, United States
Mei-Lin Chan
Affiliation:
[email protected], University of California-Davis, Mechanical & Aeronautical Engineering, Bainer Hall,, One Shields Ave, DAVIS, CA, 95616, United States
M.Saif Islam
Affiliation:
[email protected], University of California-Davis, Electrical & Computer Engineering, Kemper Hall,, One Shields Ave, DAVIS, CA, 95616, United States
David A. Horsley
Affiliation:
[email protected], University of California-Davis, Mechanical & Aeronautical Engineering, Bainer Hall,, One Shields Ave, DAVIS, CA, 95616, United States
Wei Wu
Affiliation:
[email protected], Hewlett Packard Laboratories, Quantum Science Research Advanced Studies, 1501 Page Mill Road,, Palo Alto, CA, 94304, United States
Shih Yuan Wang
Affiliation:
[email protected], Hewlett Packard Laboratories, Quantum Science Research Advanced Studies, 1501 Page Mill Road,, Palo Alto, CA, 94304, United States
R. Stanley Williams
Affiliation:
[email protected], Hewlett Packard Laboratories, Quantum Science Research Advanced Studies, 1501 Page Mill Road,, Palo Alto, CA, 94304, United States
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Abstract

We present a technique to generate ultra-smooth surfaces and direct pattern imprinting on thin metal films by flattening the bumps and spikes of a freshly vacuum deposited metal film. The technique was implemented by using a small footprint mechanical imprint press that has the capability to vary the applied pressure from 100MPa to 600MPa. The mechanical press was incorporated with a tactile force sensor that enabled direct monitoring of the applied pressure. We demonstrated the feasibility of the technique on an e-beam evaporated silver (Ag) metal film with thickness ranging from 150Å (optically thin) to 1000Å (optically thick). The film was deposited on double-polished (100)-oriented silicon surface and double-polished borosilicate glass, resulting in a varying degree of film smoothness. The surface morphology of the pressed thin film was then studied using atomic force microscopy and SEM. Our demonstration with the e-beam evaporated silver thin film exhibits the potential for applications in decreasing the scattering-induced losses in optical metamaterials, plasmonic nanodevices and electrical shorts in molecular-scale electronic devices.

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

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References

REFERENCES

1 Ushiku, Y., Ono, H., Iijima, T., Ninomiya, N., Nishiyama, A., Iwai, H., Hara, H., in Tech. Dig. Symp. VLSI Technology, Kyoto, Japan, 1993, pp. 121122 Google Scholar
2 Alford, T.L., Adams, D., Laursen, T., Ulrich, B.M., Appl. Phys. Lett. 68, 3251 (1996)Google Scholar
3 Manepalli, R., Stepniak, F., Bidstrup-Allen, S.A., Kohl, P., IEEE Trans. Adv. Packag. 22, 4 (1999)Google Scholar
4 Shelby, R.A., Smith, D.R., Schultz, S., Science 292, 77 (2001)Google Scholar
5 Smith, D.R., Padilla, W.J., Vier, D.C., Nemat-Nasser, S.C., Schultz, S., Phys. Rev. Lett. 84, 4184 (2000)Google Scholar
6 Fang, N., Lee, H., Sun, C., Zhang, X., Science 308, 534 (2005)Google Scholar
7 Islam, M. Saif, Li, Z., Chang, S.-C., Ohlberg, D.A.A., Stewart, D.R., Wang, S.Y., Williams, R.S., in Proc. 5th IEEE Conf. Nanotechnology, Nagoya, Japan, July 2005, pp. 8083 Google Scholar
8 Yen, T.J., Padilla, W.J., Fang, N., Vier, D.C., Smith, D.R., Pendry, J.B., Basov, D.N., Zhang, X., Science 303, 1496 (2004)Google Scholar
9 Dimmock, J.O., Opt. Express 11, 2397 (2003)Google Scholar
10 Islam, M. Saif, Jung, G.Y., Ha, T., Stewart, D.R., Chen, Y., Wang, S.Y., Williams, R.S., Appl. Phys. A 80, 1385 (2005)Google Scholar
12 Fang, N., Liu, Z., Yen, T.-J., Zhang, X., Appl. Phys. A 80, 1315 (2005)Google Scholar