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Radical and Molecular Product Concentration Measurements in CH4 RF Plasmas by Infrared Tunable Diode Laser Absorption

Published online by Cambridge University Press:  21 February 2011

J. Wormhoudt
J. Wormhoudt*
Affiliation:
Center for Chemical and Environmental Physics, Aerodyne Research, Inc., Billerica, Massachusetts 01821
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Abstract

Infrared tunable diode laser absorption studies of radicals and stable molecules formed in radio frequency plasmas are being carried out in a laboratory reactor which allows a long absorption path. In this paper we describe studies of CH4 RF plasmas. We report absolute concentration measurements as functions of total pressure and RF power for CH3 and C2H2 in CH4 plasmas, as well as measurements of the CH4 rotational temperature and dissociation fraction.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 165 , 1989 , 35
Copyright
Copyright © Materials Research Society 1990

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