Hostname: page-component-586b7cd67f-t7czq Total loading time: 0 Render date: 2024-11-24T19:47:54.479Z Has data issue: false hasContentIssue false
  • English
  • Français

Preferential Crystallization of β-FeSi2 from Micro-droplets Generated by Laser Ablation.

Published online by Cambridge University Press:  01 February 2011

Aiko Narazaki ,
Tadatake Sato ,
Yoshizo Kawaguchi  and
Hiroyuki Niino
Aiko Narazaki
Affiliation:
Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST) Central 5, 1–1–1 Higashi, Tsukuba, Ibaraki 305–8565, Japan
Tadatake Sato
Affiliation:
Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST) Central 5, 1–1–1 Higashi, Tsukuba, Ibaraki 305–8565, Japan
Yoshizo Kawaguchi
Affiliation:
Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST) Central 5, 1–1–1 Higashi, Tsukuba, Ibaraki 305–8565, Japan
Hiroyuki Niino
Affiliation:
Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST) Central 5, 1–1–1 Higashi, Tsukuba, Ibaraki 305–8565, Japan
Get access

Abstract

β-FeSi2 was successfully fabricated at room temperature via the deposition of molten micro-droplets generated by the KrF excimer laser ablation. Only the molten droplets precipitated as the β-FeSi2 crystalline phase on a silicon substrate kept even at room temperature, whereas the rest of film was amorphous. The crystallization behavior of micro-droplets has been discussed in the light of non-equilibrium process due to rapid cooling on the substrate. After the deposition, pulsed laser annealing was also performed in order to improve the crystallinity of the β-FeSi2 microprecipitates-containing film.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 848: Symposium FF – Solid-State Chemistry of Inorganic Materials V , 2004 , FF3.9
Copyright
Copyright © Materials Research Society 2005

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Kelly, R. and Miotello, A., “Mechanisms of Pulsed Laser Sputtering”, Pulsed Laser Deposition of Thin Films, ed. Chrisey, D. B. and Hubler, G. K. (John Wiley & Sons, 1994), chapter 3.Google Scholar
2. Yoshitake, T., Shiraishi, G. and Nagayama, K., Appl. Surf. Sci. 197, 379 (2002).Google Scholar
3. Ohtsubo, S., Yamada, S., Yonezawa, Y., Morimoto, A. and Shimizu, T., Jpn. J. Appl. Phys. 41, 3880 (2002).Google Scholar
4. Leon, D., Harry, M., Reeson, K. J. and Homewood, K. P., Nature 387, 686 (1997).Google Scholar
5. Suemasu, T., Takakura, K., Li, C., Ozawa, Y., Kumagai, Y. and Hasegawa, F., Thin Solid Films 461, 209 (2004).Google Scholar
6. Maeda, Y., Terai, Y., Itakura, M. and Kuwano, N., Thin Solid Films 461, 160 (2004).Google Scholar
7. Chu, S., Hirohada, T. and Kan, H., Jpn. J. Appl. Phys. 41, L299 (2002).Google Scholar
8. Narazaki, A., Sato, T., Kawaguchi, Y. and Niino, H., Appl. Phys. Lett. 83, 3078 (2003).Google Scholar
9. Narazaki, A., Sato, T., Kawaguchi, Y. and Niino, H., Appl. Surf. Sci. 208–209, 52 (2003).Google Scholar