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Growth Mechanism and Film Properties in Pulsed Laser-Plasma Deposition

Published online by Cambridge University Press:  28 February 2011

S. Metev  and
K. Meteva
S. Metev
Affiliation:
BIAS, Bremen Institute of Applied Beam Technology, 2800 Bremen 33, Germany
K. Meteva
Affiliation:
BIAS, Bremen Institute of Applied Beam Technology, 2800 Bremen 33, Germany
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Abstract

In the paper the results of a theoretical investigation of the growth process of laser-plasma deposited thin films are discussed. A kinetic approach has been used to establish direct relation between experimental conditions (laser flux density, substrate temperature) and film properties (thickness, structure). The results of some experimental investigations of the deposition process are presented confirming the general conclusions of the developed theoretical model.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 235: Symposium A – Phase Formation and Modification by Beam-Solid Interactions , 1991 , 831
Copyright
Copyright © Materials Research Society 1992

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References

REFERENCES

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