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Development of Block Co-Polymers as Self-Assembling Templates for Patterned Media

Published online by Cambridge University Press:  01 February 2011

Vishal Warke ,
Michael L Curry ,
Martin Gerard Bakker ,
Kunlun Hong ,
Jimmy Mays ,
Phillip Britt ,
Xuefa Li  and
Jin Wang
Vishal Warke
Affiliation:
[email protected], The University of Alabama, Center for Materials for Information Technology, Tuscaloosa, AL, 35487, United States
Michael L Curry
Affiliation:
[email protected], The University of Alabama, Center for Materials for Information Technology, Tuscaloosa, AL, 35487, United States
Martin Gerard Bakker
Affiliation:
[email protected], The University of Alabama, Chemistry, Box 870336, Tuscaloosa, AL, 35487-0336, United States
Kunlun Hong
Affiliation:
[email protected], Oak Ridge National Laboratory, Center for Nanophase Materials Science, Oak Ridge, TN, 37831, United States
Jimmy Mays
Affiliation:
[email protected], Oak Ridge National Laboratory, Center for Nanophase Materials Science, Oak Ridge, TN, 37831, United States
Phillip Britt
Affiliation:
[email protected], Oak Ridge National Laboratory, Center for Nanophase Materials Science, Oak Ridge, TN, 37831, United States
Xuefa Li
Affiliation:
[email protected], Argonne National Laboratory, Advanced Photon Source, Argonne, IL, 60439, United States
Jin Wang
Affiliation:
[email protected], Argonne National Laboratory, Advanced Photon Source, Argonne, IL, 60439, United States
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Abstract

Block copolymers that self-organize are of interest as templates for patterned media, as they potentially provide a low cost fabrication route. Poly(styrene)-Poly(methylmethacrylate) block co-polymers (PS-b-PMMA) of appropriate block length and PS to PMMA ratio self-assemble into a 2-D hexagonal phase in which the PS majority phase is continuous and surrounds cylinders of the minority, PMMA phase. For application of this phase to patterned media it is necessary that the cylinders of the minority phase be oriented perpendicular to the substrate surface. This can be achieved by a number of methods, including appropriate choice of substrate and use of a random co-polymer underlayer. Appropriate substrates include H-terminated silicon, some carbon coatings and some ITO glasses. Use of an acetic acid wash causes the minority PMMA component can be induced to be rearranged, giving rise to pores perpendicular to the substrate. Electrodeposition of a metal into the pores produces a hardmask which can be used with ion-milling to transfer the block co-polymer pattern onto a magnetic thin film.

Keywords

polymernanostructuremagnetic
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 961: Symposium O – Nanostructured and Patterned Materials for Information Storage , 2006 , 0961-O01-07
Copyright
Copyright © Materials Research Society 2007

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References

REFERENCES

1) Kim, S. O., Solak, H. H., Stoykovich, M. P., Ferrier, N. J., de Pablo, J. J., Nealey, P. F., Nature 2003, 424, 411.Google Scholar
2) Cheng, J. Y., Ross, C. A., Vanessa, Z. – H. C., Thomas, E. L., Rob, G. H. L., Vansco, J. G. Adv. Mater. 2001, 13, No. 15, 1174.Google Scholar
3) Bates, F. S., Fredrickson, G. H., Annu. Rev. Phys. Chem. 1990, 41, 525.Google Scholar
4) Warke, V., Redden, C., Bakker, M. G., Nikles, D., Hong, K., Mays, J., and Britt, P., Mater. Res. Soc. Symp. Proc. (2006) Vol. 941, 0941-Q06-10.Google Scholar
5) Xu, T., Goldbach, J. T., Misner, M. J., Kim, S., Gibaud, A., Gang, O., Ocko, B., Guarini, K. W., Black, C. T., Hawker, C. J., Russell, T. P., Macromolecules 2004, 37, 2972–2977.Google Scholar