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Comparison of the Processes Induced by Mercury Lamp and ArF Excimer Laser Photoassisted CVD of a-Si:H Films

Published online by Cambridge University Press:  28 February 2011

C. Fuchs  and
E. Fogarassy
C. Fuchs
Affiliation:
Centre de Recherches Nucléaires – Laboratoire PHASE 23, Rue du Loess F-67037 STRASBOURG, France
E. Fogarassy
Affiliation:
Centre de Recherches Nucléaires – Laboratoire PHASE 23, Rue du Loess F-67037 STRASBOURG, France
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Abstract

We compare, in this study, the photoassisted processes for silicon deposition using both a low pressure mercury lamp and an ArF excimer laser for the specific case where the SiH4 gas is sealed in the reaction chamber.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 75: Symposium B – Photon, Beam, and Plasma Stimulated Chemical Processes at Surfaces , 1986 , 195
Copyright
Copyright © Materials Research Society 1987

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