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Chemical Data Writing into Metal/oxide Interface: Characterization of Low Dimensional Interface Reactions by I-V Measurements

Published online by Cambridge University Press:  01 February 2011

Masashi Ishii
Affiliation:
[email protected], National Institute for Materials Science, X-ray laboratory, 1-2-1 Sengen, Tsukuba, Ibaraki 305 0047, Japan, +81-29-860-4576, +81-29-859-2801
Aiko Nakao
Affiliation:
[email protected], RIKEN, Beam application, 1-1 Hirosawa, Wako, Saitama 351-0198, Japan
Kenji Sakurai
Affiliation:
[email protected], National Institute for Materials Science, X-ray Laboratory, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
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Abstract

We investigated electric and chemical properties of metal/Y2O3 interfaces. The Pt/Y2O3 interface can be chemically activated by bias voltage, resulting in a microscopic oxidation-reduction center at interface. The oxidation-reduction of the center alternatively changed resistance of the Pt/Y2O3 system, and the alternation yield hysteresis with respect to the bias voltage, i.e. a memory effect. On the other hand, in Au/Y2O3 system, non-oxidization of Au induced ejection of O2 gas from the interface, so that there was no memory effect. Possible reactions of these metal/Y2O3 systems were proposed, and the balance between oxidation and reduction at microscopic center was concluded to be essential for the memory effect.

Type
Research Article
Copyright
Copyright © Materials Research Society 2008

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References

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