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Use of Single Crystal Masks for Improved Mill Characteristics in High Current Xenon Plasma FIB instrumentation

Published online by Cambridge University Press:  25 July 2016

Srinivas Subramaniam ,
Linda Smath ,
Adriane Brown  and
Kevin Johnson
Srinivas Subramaniam
Affiliation:
Intel Corporation, Hillsboro, OR, U.S.A
Linda Smath
Affiliation:
Intel Corporation, Hillsboro, OR, U.S.A
Adriane Brown
Affiliation:
Intel Corporation, Hillsboro, OR, U.S.A
Kevin Johnson
Affiliation:
Intel Corporation, Hillsboro, OR, U.S.A

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 22 , Supplement S3: Proceedings of Microscopy & Microanalysis 2016 , July 2016 , pp. 152 - 153
Copyright
© Microscopy Society of America 2016 

References

References:

[1] Subramaniam, , et al, Microscopy and Microanalysis (2014). p. 296.CrossRefGoogle Scholar
[2] Subramaniam, , et al, Microscopy and Microanalysis (2015). p. 1841.CrossRefGoogle Scholar
[3] Kim, , et. al, J. Mater. Res 14 (1999). p. 634.Google Scholar