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The Use of Phase and Amplitude Information of Reconstructed Exit Waves

Published online by Cambridge University Press:  02 July 2020

H.W. Zandbergen
H.W. Zandbergen*
Affiliation:
National Centre for HREM, Laboratory of Materials Science, Delft University of Technology, Rotterdamseweg 137, 2628ALDelft, The Netherlands
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Extract

Exit waves can be reconstructed from through focus series of HREM images or by off-axis holography [1]. We have applied the through focus method to reconstruct exit waves, using algorithms developed by Van Dyck and Coene [2]. Electron microscopy was performed with a Philips CM30ST electron microscope with a field emission gun operated at 300 kV. The high resolution images were recorded using a Tietz software package and a 1024x1024 pixel Photometrix CCD camera having a dynamic range of 12 bits. The reconstructions were done using 15-20 images with focus increments of 5.2 nm. The resulting exit waves were corrected posteriorly for the three fold astigmatism.

The exit wave is complex; consequently it contains phase and amplitude. Since in the very thin regions the specimen acts as a thin phase object, such a thin area will show little contrast, an example of which is shown in Figure 1.

Type
Electron Crystallography; The Electron Phase Problem
Information
Microscopy and Microanalysis , Volume 3 , Issue S2: Proceedings: Microscopy & Microanalysis '97, Microscopy Society of America 55th Annual Meeting, Microbeam Analysis Society 31st Annual Meeting, Histochemical Society 48th Annual Meeting, Cleveland, Ohio, August 10-14, 1997 , August 1997 , pp. 1029 - 1030
Copyright
Copyright © Microscopy Society of America 1997

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References

1.Van Dyck, D., Lichte, H. and Van der Mast, K.D., Ultramicroscopy 64, 1 (1996)10.1016/0304-3991(96)00057-5CrossRefGoogle Scholar
2.Coene, W.M.J., Thust, A., Op De Beeck, M., Van Dyck, D., Ultramicroscopy 64, 107 (1996)10.1016/0304-3991(96)00010-1CrossRefGoogle Scholar
3.Jansen, J., D. Tang, , Zandbergen, H.W. and Schenk, H., submitted to Acta Cry st A.Google Scholar
4.Zandbergen, H.W., Tang, D., Jansen, J. and Cava, R.J., Ultramicroscopy 64, 231 (1996)10.1016/0304-3991(96)00015-0CrossRefGoogle Scholar