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The Ultimate Detection Limit: Building Electron Diffraction Patterns One Electron at a Time

Published online by Cambridge University Press:  30 July 2020

Christian Kisielowski ,
Petra Specht ,
David Yancey ,
Steve Rozeveld ,
Joo Kang ,
Alyssa McKenna  and
David Barton
Christian Kisielowski
Affiliation:
The Molecular Foundry and Joint Center for Artificial Photosynthesis, Berkeley, California, United States
Petra Specht
Affiliation:
University of California in Berkeley, Berkeley, California, United States
David Yancey
Affiliation:
Dow, Midland, Minnesota, United States
Steve Rozeveld
Affiliation:
Dow, Midland, Minnesota, United States
Joo Kang
Affiliation:
Dow, Midland, Minnesota, United States
Alyssa McKenna
Affiliation:
Dow, Midland, Minnesota, United States
David Barton
Affiliation:
Dow, Midland, Minnesota, United States

Abstract

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Type
Bridging the Fundamental Electron Dose Gap for Observing Atom Processes in Complex Materials in their Native Environments
Information
Microscopy and Microanalysis , Volume 26 , Supplement S2 , August 2020 , pp. 2874 - 2876
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Copyright
Copyright © Microscopy Society of America 2020

References

Jönsson, C 1961 Zeitschrift für Physik 161 454–474; P G Merli, G F Missiroli, G Pozzi 1976 American Journal of Physics 44 306-7; H. Lichte, https://gigamove.rz.rwth-aachen.de/d/id/JDfcpin7bJbyde; A Tonomura, J Endo, T Matsuda, T Kawasaki and H Ezawa 1989, American Journal of Physics 57 117-120Google Scholar
Kisielowski, C., Specht, P., Freitag, B., Kieft, E.R., Verhoeven, W., van Rens, J.F.M., Mutsaers, P., Luiten, J., Rozeveld, S., Kang, J., McKenna, A.J., Nickias, P., Yancey, D.F., Adv. Func. Mater. 29, 1807818, 2019 10.1002/adfm.201807818CrossRefGoogle Scholar
VandenBussche, E. J.; Flannigan, D. J., Nano Lett. 19, 6687–6694, 2019 10.1021/acs.nanolett.9b03074CrossRefGoogle Scholar
van Dyck, D., Ultramicroscopy 111, 894–900, 2011 10.1016/j.ultramic.2011.01.007CrossRefGoogle Scholar
Schattschneider, P., Löffler, S., Ultramicroscopy 190, 39–44, 2018 10.1016/j.ultramic.2018.04.007CrossRefGoogle Scholar
Wojdeł, J. C., Bromley, S.T., Illas, F., Jansen, J. C., J. Mol. Model. 13, 751–756, 2007 10.1007/s00894-007-0218-3CrossRefGoogle Scholar
The work at the Molecular Foundry was supported by the DOE Office of Science, Office of Basic Energy Sciences, under contract DE-AC02-05-CH11231 and a CRADA.Google Scholar