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Three Dimensional Mask Metrology by Off-Axis Electron Holography

Published online by Cambridge University Press:  02 July 2020

Bernhard Frost  and
David C Joy
Bernhard Frost
Affiliation:
EM Facility, University of Tennessee, Knoxville, TN , 37996-0810, and, Oak Ridge National Laboratory, Oak Ridge, TN , 37831-6064
David C Joy
Affiliation:
EM Facility, University of Tennessee, Knoxville, TN , 37996-0810, and, Oak Ridge National Laboratory, Oak Ridge, TN , 37831-6064
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Abstract

Even though all real objects are three dimensional, imaging and metrology performed by using electron-beam tools such as scanning electron microscopes is inherently two dimensional. Any information about the third dimension must therefore be obtained by inference, or by time consuming special methods such as stereo-photogrammetry. If, however, the structures of interest are thin enough to be electron transparent then quantitative three dimensional metrology can be performed directly by using off-axis transmission electron holography. Here we demonstrate the application to a SCALPEL lithography mask which consists of chromium lines on a silicon support film. The off-axis holography was performed in a field emission transmission electron microscope, a Hitachi HF2000 operated at 200keV. The sample is positioned so that half the beam passes through the specimen while the rest travels only through the vacuum. An electrostatic biprism then recombines these two components to form the hologram which is recorded onto a CCD camera.

Type
Semiconductors
Information
Microscopy and Microanalysis , Volume 7 , Issue S2: Proceedings: Microscopy & Microanalysis 2001, Microscopy Society of America 59th Annual Meeting, Microbeam Analysis Society 35th Annual Meeting, Long Beach, California August 5-9, 2001 , August 2001 , pp. 574 - 575
Copyright
Copyright © Microscopy Society of America 2001

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References

1.Smith, D J and McCartney, M R, in Introduction to Electron Holography, ed E. Volkl, et al, New YorkKluwer Academic Plenum Publishers, 87, (1999)Google Scholar
2.Frost, B G and Matteucci, G ., in Introduction to Electron Holography, ed E. Volkl et al, New YorkKluwer Academic Plenum Publishers, 183, (1999)Google Scholar
3. The authors are grateful to Dr. J Griffith and Dr. A Liddle of Lucent Technologies for making samples of the SCALPEL mask available. This work was supported by the SRC under contract LJ 419.003, contract monitor Dr. D Herr. Research sponsored by the Assistant Secretary for Energy Efficiency and Renewable Energy, Office of Transportation Technologied, as part of the High Temperature Materials Laboratory User Program, Oak Ridge National Laboratory, managed by UT-Battell, LLC for the U.S. Department of Energy under contract number DE-AC05-000R22725.Google Scholar