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Thermal Stability of Hf-based High-κ Dielectric Films on Si(100)

Published online by Cambridge University Press:  22 July 2003

M.J. Kim ,
J. Huang ,
D.K. Cha ,
M.A. Quevedo-Lopez ,
R.M. Wallace  and
B.E. Gnade
M.J. Kim
Affiliation:
Department of Materials Science and Engineering, University of North Texas, Denton, TX 7620
J. Huang
Affiliation:
Department of Materials Science and Engineering, University of North Texas, Denton, TX 7620
D.K. Cha
Affiliation:
Department of Materials Science and Engineering, University of North Texas, Denton, TX 7620
M.A. Quevedo-Lopez
Affiliation:
Silicon Technology Development, Texas Instruments, Inc., Dallas, Texas 7526
R.M. Wallace
Affiliation:
Department of Materials Science and Engineering, University of North Texas, Denton, TX 7620
B.E. Gnade
Affiliation:
Department of Materials Science and Engineering, University of North Texas, Denton, TX 7620

Abstract

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Information
Microscopy and Microanalysis , Volume 9 , Issue S02 , August 2003 , pp. 506 - 507
Copyright
Copyright © Microscopy Society of America 2003