Hostname: page-component-586b7cd67f-t8hqh Total loading time: 0 Render date: 2024-11-28T17:52:36.919Z Has data issue: false hasContentIssue false
  • English
  • Français

TEM Investigation of Interfacial Reactions Between SrFeO2.5+x Thin Films and Silicon, Sapphire Substrates

Published online by Cambridge University Press:  01 August 2004

Dashan Wang ,
Xiaomei Du ,
James J. Tunney ,
Michael L. Post  and
Raynald Gauvin
Dashan Wang
Affiliation:
National Research Council of Canada, Ottawa, Canada
Xiaomei Du
Affiliation:
National Research Council of Canada, Ottawa, Canada
James J. Tunney
Affiliation:
National Research Council of Canada, Ottawa, Canada
Michael L. Post
Affiliation:
National Research Council of Canada, Ottawa, Canada
Raynald Gauvin
Affiliation:
McGill University, Montreal, Canada
Get access

Extract

Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.

Type
Research Article
Information
Microscopy and Microanalysis , Volume 10 , Issue S02 , August 2004 , pp. 572 - 573
Copyright
© 2004 Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)