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Surface Modification of a-C:H(N) Thin Films by Plasma Treatment

Published online by Cambridge University Press:  30 December 2005

L. von Mühlen ,
R. A. Simao  and
C. A. Achete
L. von Mühlen
Affiliation:
Programa de Engenharia Química, COPPE, Brazil
R. A. Simao
Affiliation:
Programa de Engenharia Metalurgica e de Materiais, COPPE, Brazil
C. A. Achete
Affiliation:
Programa de Engenharia Metalurgica e de Materiais, COPPE, Brazil
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Extract

Surface chemistry and topography of materials are generally preponderant factors in a series of material properties, such as adhesion, wettability, friction and optical properties [1]. Wettability of films, for example, can be altered significantly by modifying its surface roughness and also by incorporating functional groups. Plasma treatment is a powerful and versatile way to modify surface properties of amorphous nitrogen-incorporated carbon thin films (a-C:H(N)) and obtain materials with improved properties, once it is possible to modify the surfaces in a controlled way by specific settings of plasma conditions. [2 - 4]

Type
Other
Information
Microscopy and Microanalysis , Volume 11 , Issue S03 , December 2005 , pp. 162 - 165
Copyright
© 2005 Microscopy Society of America

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