Hostname: page-component-586b7cd67f-vdxz6 Total loading time: 0 Render date: 2024-11-24T15:23:53.488Z Has data issue: false hasContentIssue false
  • English
  • Français

Substitutional and Interstitial Diffusion of Ni across the NiSi/Si interface

Published online by Cambridge University Press:  23 November 2012

A. Thron ,
K. van Benthem ,
J. Chan ,
C.L. Hinkle ,
T.J. Pennycook ,
S.J. Pennycook  and
A. Jain
A. Thron
Affiliation:
UC Davis, Davis, CA
K. van Benthem
Affiliation:
UC Davis, Davis, CA
J. Chan
Affiliation:
UT Dallas, Dallas, TX
C.L. Hinkle
Affiliation:
UT Dallas, Dallas, TX
T.J. Pennycook
Affiliation:
Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN
S.J. Pennycook
Affiliation:
Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN
A. Jain
Affiliation:
Texas Instruments Inc., Dallas, TX
Get access

Abstract

Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.

Type
Research Article
Information
Microscopy and Microanalysis , Volume 18 , Issue S2: Proceedings of Microscopy & Microanalysis 2012 , July 2012 , pp. 344 - 345
Copyright
Copyright © Microscopy Society of America 2012

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)