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A Study of Helium Ion Beam Substrate Interaction Volume on Nanomachining Profiles in Bulk Substrates and Thin Film Membranes

Published online by Cambridge University Press:  23 November 2012

R. Livengood ,
S. Tan ,
Y. Greenzweig ,
R. Hallstein ,
D. Shima ,
K. Klein  and
A.E. Vladar
R. Livengood
Affiliation:
Intel Corporation, Santa Clara, CA
S. Tan
Affiliation:
Intel Corporation, Santa Clara, CA
Y. Greenzweig
Affiliation:
Intel Corporation, Santa Clara, CA
R. Hallstein
Affiliation:
Intel Corporation, Santa Clara, CA
D. Shima
Affiliation:
Intel Corporation, Santa Clara, CA
K. Klein
Affiliation:
NIST, Gaithersburg, MD
A.E. Vladar
Affiliation:
NIST, Gaithersburg, MD
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Abstract

Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.

Type
Research Article
Information
Microscopy and Microanalysis , Volume 18 , Issue S2: Proceedings of Microscopy & Microanalysis 2012 , July 2012 , pp. 808 - 809
Copyright
Copyright © Microscopy Society of America 2012

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