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Strain Mapping of 45 nm MOSFET by Dark-Field Inline Electron Holography

Published online by Cambridge University Press:  01 August 2010

VB Özdöl
Affiliation:
Max Planck Institute for Metals Research, Germany
CT Koch
Affiliation:
Max Planck Institute for Metals Research, Germany
PA van Aken
Affiliation:
Max Planck Institute for Metals Research, Germany

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.

Type
Abstract
Copyright
Copyright © Microscopy Society of America 2010