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STEM Analysis Of Cu(Mn) Self-Forming Diffusion Barriers on SiO2 For Applications In The Semiconductor Industry

Published online by Cambridge University Press:  23 November 2012

J.G. Lozano ,
P. Nellist ,
J. Bogan ,
P. Casey ,
A. McCay  and
G. Hughes
J.G. Lozano
Affiliation:
Department of Materials, University of Oxford, Oxford, United Kingdom
P. Nellist
Affiliation:
Department of Materials, University of Oxford, Oxford, United Kingdom
J. Bogan
Affiliation:
Dublin City University, Dublin, Ireland
P. Casey
Affiliation:
Dublin City University, Dublin, Ireland
A. McCay
Affiliation:
Dublin City University, Dublin, Ireland
G. Hughes
Affiliation:
Dublin City University, Dublin, Ireland
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Abstract

Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.

Type
Research Article
Information
Microscopy and Microanalysis , Volume 18 , Issue S2: Proceedings of Microscopy & Microanalysis 2012 , July 2012 , pp. 1842 - 1843
Copyright
Copyright © Microscopy Society of America 2012

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