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Sensitivity and Figure of Merit Measurements of EELS vs XEDS in the Analytical Electron Microscope

Published online by Cambridge University Press:  30 July 2020

Nestor Zaluzec  and
Magnus Garbrecht
Nestor Zaluzec
Affiliation:
Argonne National Laboratory, Bolingbrook, Illinois, United States
Magnus Garbrecht
Affiliation:
The University of Sydney, Sydney, New South Wales, Australia

Abstract

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Type
Pushing the Limits of Detection in Quantitative (S)TEM Imaging, EELS, and EDX
Information
Microscopy and Microanalysis , Volume 26 , Supplement S2 , August 2020 , pp. 1518 - 1521
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Copyright
Copyright © Microscopy Society of America 2020

References

Fraser, H, Klenov, D., Wang, Y., Cheng, H., Zaluzec, N.J, Microsc. Microanal. 17 (Suppl. 2), 2011 590–591, doi:10.1017/S1431927611003825CrossRefGoogle Scholar
Zaluzec, N.J., Ultramicroscopy 203 (2019) 163–169 https://doi.org/10.1016/j.ultramic.2018.11.008CrossRefGoogle Scholar
This research was supported in part by Laboratory Directed Research and Development (LDRD) funding No. 2017-153-N0 and the Photon Science Division at Argonne National Laboratory of the U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences under contract No. DE-AC02- 06CH11357.The authors acknowledge the Sydney Microscopy and Microanalysis facilities at The University of Sydney.Google Scholar