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Sample surface atomic resolution secondary electron imaging with an aberration corrected STEM

Published online by Cambridge University Press:  23 November 2012

H. Inada ,
K. Nakamura ,
K. Tamura ,
Y. Suzuki ,
T. Sato ,
M. Konno ,
D. Su ,
J. Wall ,
Y. Zhu  and
J. Ciston
H. Inada
Affiliation:
Hitachi High-Technologies, Corp, Hitachinaka, Ibaraki, Japan
K. Nakamura
Affiliation:
Hitachi High-Technologies, Corp, Hitachinaka, Ibaraki, Japan
K. Tamura
Affiliation:
Hitachi High-Technologies, Corp, Hitachinaka, Ibaraki, Japan
Y. Suzuki
Affiliation:
Hitachi High-Technologies, Corp, Hitachinaka, Ibaraki, Japan
T. Sato
Affiliation:
Hitachi High-Technologies, Corp, Hitachinaka, Ibaraki, Japan
M. Konno
Affiliation:
Hitachi High-Technologies, Corp, Hitachinaka, Ibaraki, Japan
D. Su
Affiliation:
Brookhaven National Laboratory, Upton, NY
J. Wall
Affiliation:
Brookhaven National Laboratory, Upton, NY
Y. Zhu
Affiliation:
Brookhaven National Laboratory, Upton, NY
J. Ciston
Affiliation:
Lawrence Berkeley National Laboratory, Berkley, CA
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Abstract

Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.

Type
Research Article
Information
Microscopy and Microanalysis , Volume 18 , Issue S2: Proceedings of Microscopy & Microanalysis 2012 , July 2012 , pp. 388 - 389
Copyright
Copyright © Microscopy Society of America 2012

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