Reflection Extended Electron Energy Loss Fine Structure (REXEELFS) Study Of Damage Induced By Ar⁺ on Hopg (0001) Surface.

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In recent years much attention has been paid in development of EXEELFS (EXELFS, EELFS) technique .Some people around the world focused their work in characterizing materials in both, reflection and transmission geometries [ 1-2]. These studies show that EXEELFS technique is a reliable way to obtain the local structure of these materials. Some authors have been done experiments to detect structural changes on the surfaces (epitaxial grown, small clusters grown, surface reconstruction, etc, ). In this paper we have done a systematical observation of the possible damage induced by the Ar⁺ ions on HOPG surface at different sputterin times

Experiments were taken at room temperature in a commercial UHV chamber for surface analysis, with a base pressure of 2.5 x 10^-10 Torr. A PERKIN ELMER PHI-595 scanning Auger microprobe with single pass Cylindrical Mirror Analyzer. (CMA), and coaxial election gun which can operate from 1 KeV to 10 K eV, equipped with Ar ion gun system for cleaning surfaces was used.