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Real-Time Scanning Charged-Particle Microscope Image Composition with Correction of Drift

Published online by Cambridge University Press:  02 December 2010

Petr Cizmar
Affiliation:
National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, MD 20899, USA
András E. Vladár*
Affiliation:
National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, MD 20899, USA
Michael T. Postek
Affiliation:
National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, MD 20899, USA
*
Corresponding author. E-mail: [email protected]
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Abstract

In this article, a new scanning electron microscopy (SEM) image composition technique is described, which can significantly reduce drift related image corruptions. Drift distortion commonly causes blur and distortions in the SEM images. Such corruption ordinarily appears when conventional image-acquisition methods, i.e., “slow scan” and “fast scan,” are applied. The damage is often very significant; it may render images unusable for metrology applications, especially where subnanometer accuracy is required. The described correction technique works with a large number of quickly taken frames, which are properly aligned and then composed into a single image. Such image contains much less noise than the individual frames, while the blur and deformation is minimized. This technique also provides useful information about changes of the sample position in time, which may be applied to investigate the drift properties of the instrument without a need of additional equipment.

Type
SEM Image Acquisition
Copyright
Copyright © Microscopy Society of America 2011

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Footnotes

Contribution of the National Institute of Standards and Technology (NIST); not subject to copyright. Certain commercial equipment is identified in this report to adequately describe the experimental procedure. Such identification does not imply recommendation or endorsement by the NIST, nor does it imply that the equipment identified is necessarily the best available for the purpose.

References

REFERENCES

Chang, S., Wang, C.S., Xiong, C.Y. & Fang, J. (2005). Nanoscale in-plane displacement evaluation by AFM scanning and digital image correlation processing. Nanotechnology 16(4), 344349.CrossRefGoogle Scholar
Cizmar, P., Vladar, A.E., Ming, B. & Postek, M.T. (2008). Simulated SEM images for resolution measurement. Scanning 30(5), 381391.CrossRefGoogle ScholarPubMed
Frigo, M. & Johnson, S.G. (2005). The design and implementation of FFTW3. In Proc IEEE 93, 216231.CrossRefGoogle Scholar
Gentle, J.E. (1998). Numerical Linear Algebra for Applications in Statistics. Berlin: Springer-Verlag.CrossRefGoogle Scholar
Kawasaki, T., Utsuro, H., Takai, Y. & Shimizu, R. (1999). Evaluation of image drift correction by three-dimensional Fourier analysis. J Elec Microsc 48(1), 3537.CrossRefGoogle Scholar
Mantooth, B.A., Donhauser, Z.J., Kelly, K.F. & Weiss, P.S. (2002). Cross-correlation image tracking for drift correction and adsorbate analysis. Rev Sci Instrum 73(2, Part 1), 313317.CrossRefGoogle Scholar
Papoulis, A. (1962). The Fourier Integral and Its Applications. New York: McGraw-Hill.Google Scholar
Postek, M.T., Villarrubia, J.S. & Vladar, A.E. (2005). Advanced electron microscopy needs for nanotechnology and nanomanufacturing. J Vacuum Sci & Technol B 23(6), 30153022.CrossRefGoogle Scholar
Postek, M.T., Vladar, A.E., Bennett, M.H., Rice, T. & Knowles, R. (2004). Photomask dimensional metrology in the scanning electron microscope, part II: High-pressure/environmental scanning electron microscope. J Microlithog Microfabrication and Microsystems 3(2), 224231.Google Scholar
Sutton, M.A., Li, N., Garcia, D., Cornille, N., Orteu, J.J., McNeill, S.R., Schreier, H.W. & Li, X. (2006). Metrology in a scanning electron microscope: Theoretical developments and experimental validation. Measurement Sci Technol 17(10), 26132622.CrossRefGoogle Scholar
Sutton, M.A., Li, N., Garcia, D., Cornille, N., Orteu, J.J., McNeill, S.R., Schreier, H.W., Li, X. & Reynolds, A.P. (2007a). Scanning electron microscopy for quantitative small and large deformation measurements—part II: Experimental validation for magnifications from 200 to 10,000. Exp Mechanics 47(6), 789804.CrossRefGoogle Scholar
Sutton, M.A., Li, N., Joy, D.C., Reynolds, A.P. & Li, X. (2007b). Scanning electron microscopy for quantitative small and large deformation measurements part I: SEM imaging at magnifications from 200 to 10,000. Exp Mechanics 47(6), 775787.CrossRefGoogle Scholar
Xu, Z.H., Li, X-D., Sutton, M.A. & Li, N. (2008). Drift and spatial distortion elimination in atomic force microscopy images by the digital image correlation technique. J Strain Anal Eng Design 43(8, Sp. Iss. SI), 729743.CrossRefGoogle Scholar