Hostname: page-component-586b7cd67f-vdxz6 Total loading time: 0 Render date: 2024-11-28T18:41:50.598Z Has data issue: false hasContentIssue false
  • English
  • Français

Quantitative X-Rays Microanalysis of Rough Surfaces

Published online by Cambridge University Press:  02 July 2020

Raynald Gauvin  and
Eric Lifshin
Raynald Gauvin
Affiliation:
Département de génie mécanique, Université de Sherbrooke, Sherbrooke, Québec, CanadaJ1K2R1.
Eric Lifshin
Affiliation:
Albany Institute for Materials, University at Albany, CESTM, 251 Fuller Road, Albany, NY, 12301.
Get access

Abstract

The classical schemes to convert the x-ray intensity into concentration, using the ZAF or the φ(ρ z ) methods, are valid for specimens having homogeneous composition and flat surfaces. Quantitative schemes have also been developed for x-ray microanalysis of multi-layered specimens. More recently, a quantitative method has been proposed for the microanalysis of spherical inclusions embedded in a matrix.

For the case of specimens having a non-planar surface, a quantitative method based on the peak to background ratio, using photons of the same energy, has been proposed. in order to test this correction method, a Monte Carlo program has been developed in order to compute the complete x-ray spectrum, characteristic lines plus bremstrallung, emitted from materials having rough surfaces. Figure [1] shows the geometry of the rough surfaces simulated. The parameters of these surfaces are the summit semi-angle, θ, and the height of the roughness, h.

Type
Quantitative X-Ray Microanalysis in the Microprobe, in the SEM and in The ESEM:Theory and Practice (Organized by R. Gauvin and E. Lifshin)
Information
Microscopy and Microanalysis , Volume 7 , Issue S2: Proceedings: Microscopy & Microanalysis 2001, Microscopy Society of America 59th Annual Meeting, Microbeam Analysis Society 35th Annual Meeting, Long Beach, California August 5-9, 2001 , August 2001 , pp. 692 - 693
Copyright
Copyright © Microscopy Society of America 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1.Goldstein, J. I., Newbury, D. E., Echlin, P., Joy, D. C., Romig, A.D., Lyman, C. E., Fiori, C. & Lifshin, E. (1992), “Scanning Electron Microscopy and Microanalysis”, Plenum Press, New York.CrossRefGoogle Scholar
2.Kyser, D. F. & Murata, K. (1974), “Quantitative Electron Microprobe Analysis of Thin Films on Substrate”, IBM Journal of Res. and Development, 18, pp. 352–363CrossRefGoogle Scholar
3.Gauvin, R., Hovington, P. & Drouin, D. (1995), “Quantification of Spherical Inclusions in the Scanning Electron Microscope Using Monte Carlo Simulations”, Scanning, Vol. 17, pp. 202–219.CrossRefGoogle Scholar
4.Gauvin, R. & Lifshin, E. (2000), “On the Peak to Background Ratio of X-Rays emitted from Rough Surfaces”, Microscopy & Microanalysis, Vol. 6, Supp. 2, pp. 920–921.CrossRefGoogle Scholar