Hostname: page-component-78c5997874-m6dg7 Total loading time: 0 Render date: 2024-11-08T02:45:05.930Z Has data issue: false hasContentIssue false
  • English
  • Français

Proactive Control of the Growth Behavior of a Thermally Grown Oxide by a Chemically Vapor Deposited Al2O3 Layer

Published online by Cambridge University Press:  21 July 2003

Y.-F. Su ,
L.F. Allard ,
D.W. Coffey  and
W.Y. Lee
Y.-F. Su
Affiliation:
Department of Chemical, Biochemical, and Materials Engineering, Stevens Institute of Technology, Hoboken, NJ 0707
L.F. Allard
Affiliation:
High Temperature Materials Lab., Oak Ridge National Laboratory, Oak Ridge, TN 3783
D.W. Coffey
Affiliation:
High Temperature Materials Lab., Oak Ridge National Laboratory, Oak Ridge, TN 3783
W.Y. Lee
Affiliation:
Department of Chemical, Biochemical, and Materials Engineering, Stevens Institute of Technology, Hoboken, NJ 0707

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Abstract
Information
Microscopy and Microanalysis , Volume 9 , Issue S02 , August 2003 , pp. 678 - 679
Copyright
Copyright © Microscopy Society of America 2003