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Pressure Effect on the Deposition in the a-Si:H Films by PECVD Process for Solar Cell Applications

Published online by Cambridge University Press:  23 September 2015

J. Plaza-Castillo ,
A. Garcia-Barrientos ,
M. Moreno-Moreno ,
K.Y. Vizcaino ,
J.A. Hoyo-Montano  and
G. Valencia-Palomo
J. Plaza-Castillo
Affiliation:
Department of Physics, Universidad del Atlantico, Barranquilla, Colombia.
A. Garcia-Barrientos
Affiliation:
Department of Electronics, Autonomous University of Hidalgo State, Hidalgo, Mexico. Department of Electronics, Instituto Tecnologico de Hermosillo, Sonora, Mexico.
M. Moreno-Moreno
Affiliation:
Department of Electronics, INAOE, Puebla, Mexico.
K.Y. Vizcaino
Affiliation:
Department of Physics, Universidad del Atlantico, Barranquilla, Colombia.
J.A. Hoyo-Montano
Affiliation:
Department of Electronics, Instituto Tecnologico de Hermosillo, Sonora, Mexico.
G. Valencia-Palomo
Affiliation:
Department of Electronics, Instituto Tecnologico de Hermosillo, Sonora, Mexico.

Abstract

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Abstract
Information
Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 297 - 298
Copyright
Copyright © Microscopy Society of America 2015 

References

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