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Position Normalization as a Tool to Extract Compositional and Microstructural Profiles from Backscatter and Secondary Electron Images

Published online by Cambridge University Press:  02 July 2020

P. J. Lee  and
D. C Larbalestier
P. J. Lee
Affiliation:
Applied Superconductivity Center, University of Wisconsin-Madison, Madison, WI53706
D. C Larbalestier
Affiliation:
Also the Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, WI53706
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Position normalization is a method of manipulating data from any image source so that the effective information to noise ratio is dramatically increased. In this paper we present two very different examples of the application of position normalization used in the study of high current density superconductors. In the first example we use FESEM fractography to analyze grain boundary density and grain shape in micron-diameter filaments and then normalize the data obtained from individual grains to their positions with respect to the filament-matrix interface. In this way we extract the change of grain structure with position in apparently inhomogeneous microstructure. In the second example we analyze the backscattered electron intensity, BEI, from the cross-section of a superconductor filament with respect to its proximity to phase boundaries. In this way we extract small trends in the mean atomic number with a spatial resolution of better than 100 nm.

Type
Image Simulation and Image Processing Techniques
Information
Microscopy and Microanalysis , Volume 6 , Issue S2: Proceedings: Microscopy & Microanalysis 2000, Microscopy Society of America 58th Annual Meeting, Microbeam Analysis Society 34th Annual Meeting, Microscopical Society of Canada/Societe de Microscopie de Canada 27th Annual Meeting, Philadelphia, Pennsylvania August 13-17, 2000 , August 2000 , pp. 1026 - 1027
Copyright
Copyright © Microscopy Society of America

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References

References:

1.Lee, P.J. et al., IEEE Trans. Applied Superconductivity, 7.2 (1997) 1516.CrossRefGoogle Scholar
2.Konkol, A. et al., Ultramicroscopy, 58 (1995), 233.CrossRefGoogle Scholar
3.Konkol, A., Scanning. 18.1 (1996) 13.CrossRefGoogle Scholar
4.Cousens, D. R. and Joy, D. C., Scanning, 19.8 (1997) p.547.CrossRefGoogle Scholar
5.Merli, P. G. et al., Ultramicroscopy, 65.1–2 (1996).CrossRefGoogle Scholar
6. This work supported by the U.S. Dept. of Energy, Office of Fusion Energy Sciences, DE-FG02-86ER52131 and Division of High Energy Physics DE-FG02-91ER40643, it also benefited from NSF-MRSEC DMR-9632427 supported facilities.Google Scholar