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Pattern Overlap and High Resolution Electron Backscatter Diffraction

Published online by Cambridge University Press:  23 September 2015

Vivian Tong
Affiliation:
Department of Materials, Imperial College London, Prince Consort Road, London, SW7 2AZ, UK
Jun Jiang
Affiliation:
Department of Materials, Imperial College London, Prince Consort Road, London, SW7 2AZ, UK
Angus Wilkinson
Affiliation:
Department of Materials. University of Oxford, Parks Road, Oxford, OX1 3PH, UK
Ben Britton
Affiliation:
Department of Materials, Imperial College London, Prince Consort Road, London, SW7 2AZ, UK

Abstract

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Type
Abstract
Copyright
Copyright © Microscopy Society of America 2015 

References

[1] Wilkinson, A.J., Meaden, G. & Dingley, D.J., Ultramicroscopy 22 (2006). p 1271.Google Scholar
[2] Britton, T.B., Jiang, J., Karamched, P.S. & Wilkinson, A.J., JOM 65 (2013). p 1245.Google Scholar
[3] Chen, D., Kuo, J-C. & Wu, W-T., Ultramicroscopy 111 (2011). p 1488.CrossRefGoogle Scholar
[4] Acknowledgements: The authors would like to thank Drs Stuart Wright, Eleanor Clarke, Phani Karamched and Philip Littlewood for helpful discussions over the years concerning pattern overlap at grain boundaries and its effects on HR-EBSD measurements. Funding contributions are acknowledged from ESPRC through the HexMat grant (EP/K034332/1), Rolls-Royce plc and AVIC-BIAM..Google Scholar