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A Path to EUV Photoresist Reference Metrology Using Restricted Tilt Electron Tomography
Published online by Cambridge University Press: 30 July 2020
Abstract
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- Vendor Symposium - Materials Preparation
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- Copyright
- Copyright © Microscopy Society of America 2020
References
Kawada, H., Ebizuka, Y., Sutani, T., and Kawasaki, T., “LER and LWR measurements used for monitoring wiggling and stochastic-failure (Conference Presentation),” in Metrology, Inspection, and Process Control for Microlithography XXXIII, Ukraintsev, V. A. and Adan, O., eds., 10959, International Society for Optics and Photonics, SPIE (2019).Google Scholar
Takamasu, K., Takahashi, S., Kawada, H., and Ikota, M., “Line-width roughness of advanced semiconductor features by using FIB and planar-TEM as reference metrology,” in Metrology, Inspection, and Process Control for Microlithography XXXII, Ukraintsev, V. A., ed., 10585, 48–55, International Society for Optics and Photonics, SPIE (2018).Google Scholar
Takamasu, K., Takahashi, S., Kawada, H., Ikota, M., Decoster, S., Lazzarino, F., and Lorusso, G., “Linewidth and roughness measurement of SAOP by using FIB and Planer-TEM as reference metrology,” in Metrology, Inspection,and Process Control for Microlithography XXXIII, Ukraintsev, V. A. and Adan, O., eds.,10959, 113–120, International Society for Optics and Photonics, SPIE (2019).Google Scholar
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