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Origin of Ferroelectricity in Thin Film HfO2 Probed by Revolving STEM and PACBED

Published online by Cambridge University Press:  23 September 2015

Xiahan Sang ,
Everett D. Grimley ,
Tony Schenk ,
Uwe Schroeder  and
James M. LeBeau
Xiahan Sang
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 2. NaMLab gGmbH/TU Dresden, Noethnitzer Str. 64, D-01187 Dresden, Germany
Everett D. Grimley
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 2. NaMLab gGmbH/TU Dresden, Noethnitzer Str. 64, D-01187 Dresden, Germany
Tony Schenk
Affiliation:
NaMLab gGmbH/TU Dresden, Noethnitzer Str. 64, D-01187 Dresden, Germany
Uwe Schroeder
Affiliation:
NaMLab gGmbH/TU Dresden, Noethnitzer Str. 64, D-01187 Dresden, Germany
James M. LeBeau
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 2. NaMLab gGmbH/TU Dresden, Noethnitzer Str. 64, D-01187 Dresden, Germany

Abstract

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Information
Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 779 - 780
Copyright
Copyright © Microscopy Society of America 2015 

References

References:

[1] Boscke, T. S., et al., Applied Physics Letters 99 (2011). p 102903.Google Scholar
[2] Muller, J., et al., Nano Letters 12 (2012). p 4318.Google Scholar
[3] Martin, D., et al., Advanced Materials 26 (2014). p 8198.Google Scholar
[4] Huan, T. D., et al., Physical Review B 90 (2014). p 064111.CrossRefGoogle Scholar
[5] Sang, X. & LeBeau, J. M., Ultramicroscopy 138 (2014). p 28.Google Scholar
[6] LeBeau, J. M., et al., Applied Physics Letters 98 (2011). p 052904.Google Scholar
[7] Funding for this research was provided by the National Science Foundation (Award Number DMR-1350273) and the German Research Foundation (Deutsche Forschungsgemeinschaft) in the frame of the "Inferox" project. This material is based upon work supported by the National Science Foundation Graduate Research Fellowship for EDG under Grant No. (DGE-1252376). XS, EDG, and JML acknowledge use of the Analytical Instrumentation Facility (AIF) at North Carolina State University, which is supported by the State of North Carolina and the National Science Foundation. Authors acknowledge Christoph Adelmann for HfO2 film deposition, and Tina Sturm and Almut Pohl from Leibniz IFW Dresden, Germany for FIB preparation of the lamellas..Google Scholar