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Optical Characterization of an X-ray Zoom Lens

Published online by Cambridge University Press:  10 August 2018

Elisa Kornemann ,
Ottó Márkus ,
Alexander Opolka ,
Kawal Sawhney ,
Angelica Cecilia ,
Mathias Hurst ,
Tilo Baumbach ,
Arndt Last  and
Jürgen Mohr
Elisa Kornemann*
Affiliation:
IMT, Karlsruhe Institute of Technology (KIT), Eggenstein-Leopoldshafen, Germany
Ottó Márkus
Affiliation:
IMT, Karlsruhe Institute of Technology (KIT), Eggenstein-Leopoldshafen, Germany
Alexander Opolka
Affiliation:
IMT, Karlsruhe Institute of Technology (KIT), Eggenstein-Leopoldshafen, Germany
Kawal Sawhney
Affiliation:
Diamond Light Source, Harwell Science and Innovation Campus, Didcot, United Kingdom
Angelica Cecilia
Affiliation:
IPS, Karlsruhe Institute of Technology (KIT), Eggenstein-Leopoldshafen, Germany
Mathias Hurst
Affiliation:
IPS, Karlsruhe Institute of Technology (KIT), Eggenstein-Leopoldshafen, Germany
Tilo Baumbach
Affiliation:
IPS, Karlsruhe Institute of Technology (KIT), Eggenstein-Leopoldshafen, Germany
Arndt Last
Affiliation:
IMT, Karlsruhe Institute of Technology (KIT), Eggenstein-Leopoldshafen, Germany
Jürgen Mohr
Affiliation:
IMT, Karlsruhe Institute of Technology (KIT), Eggenstein-Leopoldshafen, Germany
*
*[email protected]

Abstract

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Abstract
Information
Microscopy and Microanalysis , Volume 24 , Supplement S2: Proceedings of the 14th International Conference on X-ray Microscopy (XRM2018) , August 2018 , pp. 268 - 269
Copyright
© Microscopy Society of America 2018 

References

[1] Kornemann, E., et al, Optics Express 25 2017) pp. 22455–22466.Google Scholar
[2] Nazmov, V., et al, Microsystem Technologies 10 2004) pp. 716–721.CrossRefGoogle Scholar
[3] Vaughan, G. B. M., et al, J. Synchrotron Rad 18 2011) pp. 125–133.Google Scholar
[4] Duller, G. M. A., et al, Conf. Proc. MEDSI'16 2017) paper WEPE22 pp. 345–347.Google Scholar
[5] The authors thank the Karlsruhe Nano Micro Facility (KNMF), a research infrastructure in the Helm-holtz association, for the possibility to fabricate the polymer X-ray lenses by X-ray lithography. We acknowledge the support of the Karlsruhe School of Optics and Photonics (KSOP). We thank Dr. K. Sawhney and Dr. A. Cecilia for providing beam time and useful discussions to this work..Google Scholar